SAN DIEGO, July 21 /PRNewswire-FirstCall/ -- Cymer, Inc. (Nasdaq: CYMI), the market's leading developer of light sources used to pattern advanced semiconductor chips, announced today that the world's first field-selectable 60 watt-90 watt (W) immersion light source--the XLR 600ix--has been integrated into a Nikon scanner, and successfully installed at a large Asian chipmaker. This milestone represents the first immersion light source of this kind to be installed at a major chipmaker, and demonstrates chipmakers' continued recognition of Cymer's XLR platform as the light source of choice for immersion lithography.

"Cymer's XLR 600ix, with 90W capability, enables our scanners to meet chipmakers' high throughput requirements for double patterning at the 32 nm process node and beyond," said Mr. Toshikazu Umatate, vice president, Precision Equipment Company, Nikon Corporation.

Introduced in February 2009, the XLR 600ix delivers improved on-wafer performance to chipmakers, and offers newly developed optics technology for higher-powered applications. The light source also provides industry-leading performance enhancements over the XLR 500i, including a 1.5x improvement in wavelength and bandwidth stability and a 2x improvement in dose stability. To-date, all of the industry's immersion double patterning light source selections in 2009 have been awarded to Cymer.

"Cymer is committed to providing solutions that enable next-generation lithography, and we're proud to strengthen our partnership with Nikon through this installation, while enabling their customer to advance its competitive position with this leading-edge tool," said Ed Brown, president and chief operating officer for Cymer. "The XLR 600ix's unique ability to operate from 60W to 90W, coupled with its optical performance improvement and overall low-cost benefits were drivers in the selection of our light source for this application."

Cymer's XLR 600ix comes equipped with Gas Lifetime eXtension(TM) technology, which reduces light source downtime during gas exchanges by a factor of 20, while improving performance stability. The XLR 600ix is also available with Cymer's OnPulse(TM) Laser Life Program, which guarantees a year-over-year per-pulse cost savings for the life of the light source, and stable, predictable running costs that scale with the level of wafer production.

Forward Looking Statements

Statements in this press release that are not strictly historical in nature are forward-looking statements. These statements include, but are not limited to references to the XLR 600ix delivering improved performance and all the other benefits of the XLR series of products; and the benefits of features such as the GLX2 control system. These statements are based only on current information and expectations that are inherently subject to change and involve a number of risks and uncertainties. Actual events or results may differ materially from those projected in these statements due to various factors, including but not limited to: the possibility that the XLR 600ix and features such as GLX may not perform as, or deliver the cost benefits, expected; new and enhanced product offerings by competitors; the timing of customer orders, shipments and acceptances; the rate at which semiconductor manufacturers take delivery of photolithography tools from the company's customers; delays or cancellations by customers of their orders; cyclicality in the semiconductor equipment industry; the demand for semiconductors in general, and, in particular, for leading-edge devices with smaller geometries; inability by the company to meet its production and/or product development schedules; and inability of the company to secure adequate supplies of critical components for its advanced products. For a discussion of these and other factors which may cause our actual events or results to differ from those projected, please refer to the company's most recent annual report on Form 10-K and quarterly reports on Form 10-Q, as well as other subsequent filings with the Securities and Exchange Commission. You are cautioned not to place undue reliance on these forward-looking statements, which speak only as of the date of this press release. All forward-looking statements are qualified in their entirety by this cautionary statement, and the company undertakes no obligation to revise or update any forward-looking statements to reflect events or circumstances after the date of this press release.

About Cymer

Cymer, Inc. is the market leader in developing light sources, used by chipmakers worldwide as the essential light source for DUV lithography systems. Cymer's light sources have been widely adopted by the world's top chipmakers and the company's installed base comprises more than 3,300 systems. Continuing its legacy of leadership, Cymer is currently pioneering the industry's transition to EUV lithography, the next viable step on the technology roadmap for the creation of smaller, faster chips. The company is headquartered in San Diego, Calif., and supports its customers from numerous offices around the globe. Cymer maintains a Web site to which it regularly posts press releases, SEC filings, and additional information about Cymer. Interested persons can also subscribe to automated e-mail alerts or RSS feeds. Please visit www.cymer.com for additional information.

SOURCE Cymer, Inc.